APEC’s Ion Implantation System is an ion implantation apparatus using a pulse power supply technology, noise shielding technology and plasma application technology.
It can be applied to many applications for the treatment of various dental implants and coating material.
This unit is a high vacuum chamber for brazing and baking process for RF accelerator cavities that can be heating up to 1200 degree. In addition, attached to a hydrogen burning module, it is possible in a hydrogen atmosphere. Effective heating area is divided to enhance the uniformity of the heating temperature in the range of 250 mm X 1000 mm and three areas are controlled independently.
The APEC’s Electron Beam Uniformity Display Unit is a 3D displaying unit to measure the density of electrons emitted in a large area and designed to read the data easily.
Real-time measurement and data analysis are available and it can be adapted to various communication schemes. (RS-232, RS-485, Ethernet Interface)
APEC’s Electron Gun Power Source (EGPS) based on direct switching is the most well-known devices for high voltage switching. The advantages of power sources are well- controlled electron gun direction, density and energy. The EGPS is referenced to cathode and its output is connected to the grid terminal on the E-Gun.
The EGPS is available of dual pulse and triode operation as the following requirement of the E-Gun.
